Electronics, Telecommunications
Semiconductors
Gas Precursors for Dry Etching and RIE
- Etching agent (C5F8)
- High Selective and Low Damage SiN Etching (R&D Sample) *
- High Selective SiO2 and Low-K Etching (R&D Sample) *
SDSs・chemSHERPA files are available upon request. Please search and download there.