Electronic Materials
Electron Beam Resist
High Performance Positive EB Resist:ZEP520A series
Characteristics
ZEP520A is high performance positive EB resist which shows high resolution and good dry etch resistance.
EB resist product lineup
| Item | Visco sity (mPa•s) |
FT(nm) @2000rpm |
Solvent | Form | |
|---|---|---|---|---|---|
| EB Resist | ZEP520A | 11 | 500 | Anisole | 1QT bottle/ 100ml bottle |
| ZEP520A-7 | 7 | 300 | |||
Developer product lineup
| Item | Feature | Package | |
|---|---|---|---|
| Developer | ZED-N50 | high sensitivity | GAL bottle |
ZEP520A
Spin Curve
High resolution
ZEP520A can resolve L/S=25nm/25nm(FT=50nm).
Developer:ZED-N50
Evaluation sample:ZEP 520 A-7 was diluted 2.1 times with anisole.
High Performance Positive EB Resist:ZEP530A
Characteristics
ZEP530A is a high performance positive e-beam resist with ultra fine resolution, superior dry etch resistance, and wide process margin ever before.
Thin film formation is possible depending on coating condition.
Product
| Item | Visco sity (mPa•s) |
FT(nm) @2000rpm |
Solvent | Package | |
|---|---|---|---|---|---|
| E-Beam Resist | ZEP530A-6 | 6 | 200 | Anisole | 1QT bottle/ 100ml bottle |
Developer product
| Item | Feature | Package | |
|---|---|---|---|
| Developer | ZED-N60 | High resolution Wide margin |
Gallon bottle |
ZEP530A
Spin Curve
Ultra fine resolution
ZEP530A has achieved L/S=18 nm.
It has wide exposure margin.
Evaluation sample:ZEP 530 A-6 was diluted 3 times with anisole.
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