Electronic Materials

Electron Beam Resist

High Performance Positive EB Resist:ZEP520A series

Characteristics

ZEP520A is high performance positive EB resist which shows high resolution and good dry etch resistance.

EB resist product lineup

Item Visco
sity
(mPa•s)
FT(nm)
@2000rpm
Solvent Form
EB Resist ZEP520A 11 500 Anisole 1QT bottle/
100ml bottle
ZEP520A-7 7 300

Developer product lineup

Item Feature Package
Developer ZED-N50 high sensitivity GAL bottle

ZEP520A

Spin Curve
Spin Curve
ZEP520A
High resolution

ZEP520A can resolve L/S=25nm/25nm(FT=50nm).
Developer:ZED-N50
Evaluation sample:ZEP 520 A-7 was diluted 2.1 times with anisole.

High Performance Positive EB Resist:ZEP530A

Characteristics

ZEP530A is a high performance positive e-beam resist with ultra fine resolution, superior dry etch resistance, and wide process margin ever before.
Thin film formation is possible depending on coating condition.

Product

Item Visco
sity
(mPa•s)
FT(nm)
@2000rpm
Solvent Package
E-Beam Resist ZEP530A-6 6 200 Anisole 1QT bottle/
100ml bottle

Developer product

Item Feature Package
Developer ZED-N60 High resolution
Wide margin
Gallon bottle

ZEP530A

Spin Curve
Spin Curve
ZEP530A
Ultra fine resolution

ZEP530A has achieved L/S=18 nm.
It has wide exposure margin.
Evaluation sample:ZEP 530 A-6 was diluted 3 times with anisole.

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