Electron Beam Resist
High Performance Positive EB Resist:ZEP520A series
ZEP520A is high performance positive EB resist which shows high resolution and good dry etch resistance.
EB resist product lineup
|EB Resist||ZEP520A||11||500||Anisole||1QT bottle/
Developer product lineup
|Developer||ZED-N50||high sensitivity||GAL bottle|
ZEP520A can resolve L/S=25nm/25nm(FT=50nm).
Evaluation sample:ZEP 520 A-7 was diluted 2.1 times with anisole.
High Performance Positive EB Resist:ZEP530A
ZEP530A is a high performance positive e-beam resist with ultra fine resolution, superior dry etch resistance, and wide process margin ever before.
Thin film formation is possible depending on coating condition.
|E-Beam Resist||ZEP530A-6||6||200||Anisole||1QT bottle/
ZEP530A has achieved L/S=18 nm.
It has wide exposure margin.
Evaluation sample:ZEP 530 A-6 was diluted 3 times with anisole.