Home> Press Release> Press Release (2019)> ZEON places a new production ZEP530A with the high resolution on the market for next-generation electronics devices.

ZEON places a new production ZEP530A with the high resolution on the market for next-generation electronics devices.Print Page

August 2, 2019


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ZEON introduces ZEP530A for high resolution electron beam lithography for next-generation electronics devices.



ZEP520A of ZEP series has been commercially available for over 20 years. ZEP is designed as a main chain scission-type positive-tone photoresist.

ZEON is proud to announce the commercialization of the next generation of the ZEP series, ZEP530A.

ZEP530A offers excellent dry etch resistance, wide litho process margins, and ultra-high resolution.

ZEP530A can easily resolve 17 nm half pitch line and space pattern.

Combining ZEP530A with the new developer, ZED-N60, an even higher resolution can be achieved.

ZEP530A is an excellent fit for manufacturing of next-generation electronics devices, including 5G wireless technology.

ZEP530A is the next benchmark for positive photoresists in electron beam lithography while ZEON continues the development roadmap for photoresists.

Top-view of Scanning Electron Microscope
L/S : Line and Space Pattern

Film Thickness: 40nm<br>Electron Beam Lithography Exposure : ELS-F150 (ELIONIX INC.) Film Thickness: 40nm
Electron Beam Lithography Exposure : ELS-F150 (ELIONIX INC.)
mailFor further information
  • Zeon Corporation,
    Department of Corporate Communications
  • Tel: +81-3-3216-2747
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Home> Press Release> Press Release (2019)> ZEON places a new production ZEP530A with the high resolution on the market for next-generation electronics devices.
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