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Home> Products> Product categories> Electronics, Telecommunications> Semiconductors> Resist> High Performance Positive EB Resist:ZEP530A

High Performance Positive EB Resist:ZEP530APrint Page

Characteristics

ZEP530A is a high performance positive e-beam resist with ultra fine resolution, superior dry etch resistance, and wide process margin ever before.
Thin film formation is possible depending on coating condition.

Product

  • EB resist product lineup

Developer product

  • Developer product lineup


Spin Curve

Spin Curve

Ultra fine resolution

ZEP530A has achieved L/S=18 nm.
It has wide exposure margin.
Evaluation sample:ZEP 530 A-6 was diluted 3 times with anisole.


ZEP520A高解像性(2)

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