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We provide various chemicals, solutions, automated chemical supply systems, and etching agents used in the manufacture of semiconductors.

Electron beam resist >>
Thinner for electron beam resist >>
Developer and rinse for electron beam resist >>
ZEONREX® : LCD photoresist >>
Separator and insulator for EL display >>
Photoresist developer >>
Adhesive promoter >>
Cleaner >>
Etching agent (C5F8) >>


Electron beam resist
A wide selection for a variety of needs, including photomasks, EB direct drawing, thin film magnetic heads, and compound semiconductors, as well as research and development.

Product name Properties Applications
ZEP520A
ZEP520A-7
Positive tone, Solvent developable, High dry etching resistance R&D, GMR head, etc.
ZEP7000 Positive tone, Solvent developable, High dry etching resistance Photo mask, X-ray mask, R&D, etc.


Thinner for electron beam resist
Solvent to adjust the viscosity of ZEON’s electron beam resist

Product name Properties Applications
ZEP-A For ZEP520A Thinner, Cleaner
ZEP-D For ZEP7000 Thinner, Cleaner
ZMPA For TFT resist Thinner


Developer and rinse for electron beam resist
Developers and rinse for ZEON's electron beam resist

Product name Properties Applications
ZEP-RD High resolution Developer for ZEP520A
ZED-N50 High resolution, High γ value Developer for ZEP520A
ZED-500 High resolution Developer for ZEP7000
ZED-750 High resolution, High residual thickness Developer for ZEP7000
ZMD-D Rinse for ZEP7000  


ZEONREX® : LCD photoresist
Resist for LCD displays

Product name Properties Applications
ZPP1850 Ultra-high sensitivity, High adhesion TFT
ZPP1900 Ultra-high sensitivity, For slit and spin coating TFT
ZPP2400 Ultra-high sensitivity, For spinless coating TFT


Separator and insulator for EL display
Organic EL display material

Product name Properties Applications
ZPN2464 Under cut pattern profile, Good thermal stability, Low degas level Cathode Electrode for EL device
ZWD6216 Alkaline development, Good organic solvent resistance, Low degas level Insulator for EL device


Photoresist developer
Solvent for photoresist developing, also compatible for LCD resist

Product name Properties Applications
ZTMA100-5L Alkaline developer, TMAH 2.38% Photoresist, etc.
ZTMA-U20 Alkaline developer, TMAH 20% Photoresist, etc.


Adhesive promoter
Adhesive promoter for photoresists of semiconductor, LCD

Product name Properties Applications
ZHMDS100 High adhesion for photoresist Photoresist, etc.


Cleaner
Back rinse and edge-bead remover and can be used for cleaning of resist coating equipment

Product name Properties Applications
ZS-50 Safe, High performance Semiconductors
ZDMAC High cleansing ability Semiconductors


Etching agent (C5F8)
Next-generation etching agent friendly to the global environment

Product name Properties Applications
ZEORORA®
ZFL-58
High selectivity,
Environmentally friendly
Dry etching



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